Pōkole no ka Molecular Beam Epitaxy (MBE)
Ua hoʻomohala ʻia ka ʻenehana o Molecular Beam Epitaxy (MBE) i ka makahiki 1950 e hoʻomākaukau i nā mea kiʻi ʻoniʻoni semiconductor me ka hoʻohana ʻana i ka ʻenehana evaporation vacuum. Me ka hoʻomohala ʻana o ka ʻenehana ʻenehana kiʻekiʻe kiʻekiʻe, ua hoʻonui ʻia ka noi o ka ʻenehana i ke kahua o ka ʻepekema semiconductor.
ʻO ke kumu o ka noiʻi semiconductor material ka koi no nā mea hou, hiki ke hoʻomaikaʻi i ka hana o ka ʻōnaehana. I ka huli ʻana, hiki i ka ʻenehana waiwai hou ke hana i nā mea hana hou a me nā ʻenehana hou. ʻO ka molecular beam epitaxy (MBE) kahi ʻenehana ʻenekini kiʻekiʻe no ka ulu epitaxial layer (maʻamau semiconductor). Hoʻohana ia i ka kukuna wela o nā kumu kumu a i ʻole nā molekole e hoʻopili ana i ka substrate kristal hoʻokahi. ʻO nā hiʻohiʻona ʻeleʻele kiʻekiʻe kiʻekiʻe o ke kaʻina e ʻae i ka metallization in-situ a me ka ulu ʻana o nā mea insulating ma luna o nā ʻili semiconductor ulu hou, e hopena i nā pilina pollution-free.
ʻenehana MBE
Ua lawe ʻia ka molecular beam epitaxy ma kahi ʻūhā kiʻekiʻe a i ʻole ka ʻūhā kiʻekiʻe kiʻekiʻe (1 x 10-8Pa) kaiapuni. ʻO ka hiʻohiʻona koʻikoʻi o ka molecular beam epitaxy ʻo ia ka haʻahaʻa haʻahaʻa haʻahaʻa, kahi e hiki ai i ke kiʻiʻoniʻoni ke ulu epitaxial ma ka liʻiliʻi ma lalo o 3000 nm i kēlā me kēia hola. ʻO kēlā ʻano haʻahaʻa haʻahaʻa e koi ai i kahi mānoanoa kiʻekiʻe e loaʻa ai ke kiʻekiʻe o ka maʻemaʻe like me nā ʻano hana hoʻomoe ʻē aʻe.
No ka hoʻokō ʻana i ka ʻūhā kiʻekiʻe kiʻekiʻe i hōʻike ʻia ma luna nei, ʻo ka mea MBE （Knudsen cell） he papa hoʻoluʻu, a pono e mālama ʻia ke kaiapuni ultra-kiʻekiʻe o ke keʻena ulu me ka hoʻohana ʻana i ka ʻōnaehana kahe wai. Hoʻomaʻalili ka wai i ka wela o loko o ka mea i 77 Kelvin (−196 °C). Hiki i ke kaiapuni haʻahaʻa haʻahaʻa ke hoʻohaʻahaʻa i ka ʻike o nā mea haumia i loko o ka vacuum a hāʻawi i nā kūlana maikaʻi aʻe no ka waiho ʻana o nā kiʻiʻoniʻoni lahilahi. No laila, koi ʻia kahi ʻōnaehana hoʻoheheʻe ʻana i ka wai no ka MBE e hāʻawi i kahi lako hoʻomau a paʻa o -196 °C wai nitrogen.
Pūnaehana Kaapuni Hoʻoluʻu Nitrogen Liquid
ʻO ka ʻōnaehana hoʻoheheʻe hoʻoheheʻe ʻana o Vacuum liquid nitrogen ka mea nui,
● pahu cryogenic
● kumu a me ka lālā ʻaʻahu ʻaʻahu ʻaʻahu paipu / ʻaʻahu ʻaʻa i hoʻopaʻa ʻia
● ʻO MBE mea hoʻokaʻawale ʻokoʻa a me kahi paipu hoʻoheheʻe ʻia i ka ʻūhā
● ʻokoʻa nā ʻūhā ʻaʻahu ʻokoʻa
● kinoea-wai pale
● kānana ʻaʻahu ʻaʻahu
● ʻōnaehana hoʻoheheʻe ʻia
● ʻōnaehana hoʻomaʻamaʻa mua a hoʻomaʻemaʻe
Ua ʻike ʻo HL Cryogenic Equipment Company i ke koi ʻana o MBE wai hauʻoli ʻōnaehana, hoʻonohonoho ʻia ka iwi kuamoʻo no ka hoʻomohala kūleʻa i kahi ʻōnaehana hoʻoheheʻe wai MBE kūikawā no ka ʻenehana MBE a me kahi hoʻonohonoho piha o ka insulate.edʻōnaehana paipu, i hoʻohana ʻia i nā ʻoihana he nui, nā kulanui a me nā keʻena noiʻi.
HL Cryogenic Lako
ʻO HL Cryogenic Equipment i hoʻokumu ʻia ma 1992 he hōʻailona pili iā Chengdu Holy Cryogenic Equipment Company ma Kina. Hoʻokumuʻia ka HL Cryogenic Equipment i ka hoʻolālā a me ka hanaʻana i ka High Vacuum Insulated Cryogenic Piping System a me nā lako kākoʻo pili.
No ka ʻike hou aku, e ʻoluʻolu e kipa i ka pūnaewele officialwww.hlcryo.com, a i ʻole leka uila iāinfo@cdholy.com.
Ka manawa hoʻouna: Mei-06-2021
