ʻEnehana
ʻO ka epitaxy beam Molecular, a i ʻole MBE, kahi hana hou no ka hoʻoulu ʻana i nā kiʻi ʻoniʻoni lahilahi kiʻekiʻe o nā aniani ma nā aniani substrates. I nā kūlana uila kiʻekiʻe loa, e ka umu hoʻomehana hoʻomāhuahua me nā ʻano o nā pono e koi ʻia a hoʻonui i ka mahu, ma o nā puka i hana ʻia ma hope o ka hoʻopili ʻana i ka lāʻau atomic a i ʻole ka lāʻau mole mole, hoʻopiʻi pono i ka mahana kūpono o ka substrate aniani hoʻokahi, e kaohi ana i ka lāʻau mole i ke ʻimi ʻana i ka substrate i ka manawa like, hiki iā ia ke hana i nā molaki a i ʻole nā ʻoma i nā papa hoʻonohonoho aniani e hana i kahi kiʻi lahilahi ma kahi "ulu" substrate.
No ka hana maʻamau o ka pono MBE, pono ke hoʻomau ʻia ka maʻemaʻe kiʻekiʻe, kaomi haʻahaʻa a me ka nitrogen wai piha maʻemaʻe a lawe mau ʻia i ka lumi hōʻoluʻolu o nā pono. Ma ka laulaha, kahi pahu e hāʻawi i ka nitrogen wai i loaʻa kahi kaomi puka ma waena o 0.3MPa a me 0.8MPa. Hoʻohui maʻalahi ʻia ka nitrogen liu ma -196 into i loko o nitrogen i ka lawe ʻana o ka pipeline I ka manawa e hoʻoheheʻe ʻia ai ka nitrogen wai me ka lakio gas-wai ma kahi o 1: 700 i ka paipu, e noho ia i kahi nui o ke kahe o ka nitrogen wai a hoʻemi i ke kahe maʻamau i ka hopena o ka paipu nitrogen wai. Hoʻohui ʻia, i loko o ka pahu mālama mālama nitrogen wai, aia paha he ʻōpala i hoʻomaʻemaʻe ʻole ʻia. I ka paipu nitrogen wai, ke alakaʻi o ka ea pulu e alakaʻi i ka hanauna o ka hau hau. Inā hoʻokuʻu ʻia kēia mau impurities i loko o nā lakohana, e kumu ia i nā pōʻino i ʻike ʻole ʻia i nā lakohana.
No laila, lawe ʻia ka nitrogen wai i loko o ka pahu waihona waho i nā pono MBE i loko o ka hale hana manuahi ʻole me ke kiʻekiʻe kiʻekiʻe, kūpaʻa a maʻemaʻe, a me ke kaomi haʻahaʻa, ʻaʻohe nitrogen, ʻaʻohe impurities, 24 mau hola i kāpae ʻole ʻia, he huahana kūpono.
Hoʻohālikelike i nā pono MBE
Mai ka 2005, HL Cryogenic Equipment (HL CRYO) e hoʻomaikaʻi ana a hoʻomaikaʻi i kēia ʻōnaehana a hui pū me nā mea hana MBE kūwaho honua. Hana nā mea hana MBE, e like me DCA, REBER, i nā pilina pilina me kā mākou ʻoihana. Ua hana pū nā mea hana MBE, me DCA a me REBER, i kahi nui o nā papahana.
He mea alakaʻi nui ʻo Riber SA i ka honua holoʻokoʻa o nā huahana molika epitaxy (MBE) a me nā lawelawe e pili ana no ka noiʻi semiconductor compound a me nā noi ʻoihana. Hiki i ka mea Riber MBE ke waiho i nā papa lahilahi o nā mea ma ka substrate, me nā kaohi kiʻekiʻe loa. ʻO ka lako pono o ka HL Cryogenic Equipment (HL CRYO) i lako me Riber SA ʻO ka lakohana ʻoi loa ʻo Riber 6000 a ʻo ka mea liʻiliʻi ʻo Compact 21. Aia ia i ke kūlana maikaʻi a ʻike ʻia e nā mea kūʻai aku.
ʻO DCA ka MBE oxide alakaʻi o ka honua. Mai ka makahiki 1993, ua hoʻokō ʻia ka hoʻomohala ʻōnaehana o nā ʻenehana hoʻoheheʻe ʻana, ka hoʻomehana substrate antioxidant a me nā kumuwaiwai antioxidant. No kēia kumu, ua koho nā laboratories alakaʻi he nui i ʻenehana ʻenehana DCA. Hoʻohana ʻia nā ʻōnaehana MBE semiconductor Composite a puni ka honua. ʻO ka ʻōnaehana VJ wai nitrogen e holo nei o HL Cryogenic Equipment (HL CRYO) a me nā pono MBE o nā mana he nui o DCA i loaʻa ka ʻike like i nā papahana he nui, e like me ke ʻano P600, R450, SGC800 etc.
Pākaukau Hana
ʻO Shanghai Institute of Physics Physics, Ke Keʻena ʻepekema Haina |
ʻO ka 11th Institute of China Electronics Technology Corporation |
Ke KeʻenaʻOihana Semiconductors, Ke Kula Kaiapuni Haina |
Huawei |
Alibaba DAMO Academy |
ʻO Powertech Technology Inc. |
ʻO Delta Electronics Inc. |
ʻO Suzhou Everbright Photonics |
Ka manawa Post: Mei-26-2021